Peer-reviewed veterinary case report
Atomic Layer Deposition of Nickel Oxides as Electrocatalyst for Oxygen Evolution Reaction.
- Year:
- 2025
- Authors:
- Chen J et al.
- Affiliation:
- School of Materials Science and Engineering · China
Abstract
In this study, we present atomic layer deposition (ALD) of nickel oxides (NiO<sub>x</sub>) using a new nickel precursor, (methylcyclopentadienyl)(cyclopentadienyl)nickel (NiCp(MeCp)), and ozone (O<sub>3</sub>) as the oxygen source. The process features a relatively short saturation pulse of the precursor (NiCp(MeCp)) and a broad temperature window (150-250 °C) with a consistent growth rate of 0.39 Å per cycle. The NiO<sub>x</sub> film deposited at 250 °C primarily exhibits a polycrystalline cubic phase with minimal carbon contamination. Notably, the post-annealed ALD NiO<sub>x</sub> film demonstrates attractive electrocatalytic performance on the oxygen evolution reaction (OER) by providing a low overpotential of 320 mV at 10 mA cm<sup>-2</sup>, a low Tafel slope of 70.5 mV dec<sup>-1</sup>, and sufficient catalytic stability. These results highlight the potential of the ALD process using the NiCp(MeCp) precursor for the fabrication of high-activity catalysts.
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Search related cases →Original publication: https://europepmc.org/article/MED/40214520