Atomic Layer Processes for UV-Stable Polymers: Synergistic Effects of Infiltration and Deposition of ZnO.

Abstract

Ultraviolet (UV) radiation is the major cause of polymer degradation in outdoor environments, accelerating mechanical failure and color change, leading to plastic waste accumulation. Effective UV-protective strategies that preserve polymer functionality are therefore critical for extending material longevity in UV-intense environments. Here, we present a synergistic approach combining vapor phase infiltration (VPI) and atomic layer deposition (ALD) to engineer nanoscale zinc oxide (ZnO) coatings on poly(lactic acid) (PLA), a UV-sensitive polymer. Individually, ALD and VPI offer minimal enhancement in UV stability; however, their sequential application enables the formation of conformal, polycrystalline ZnO films that dramatically improve UV resistance in both 3D-printed structures and thin-film PLA models. In situ microgravimetry and cross-sectional electron microscopy reveal that VPI introduces ZnO nucleation sites within and atop the polymer matrix, promoting a >10-fold increase in ZnO growth per ALD cycle. The resulting ZnO-PLA hybrids absorb over 90% of incident UV-C radiation while maintaining high optical transparency in the visible range. This low-temperature, scalable process provides a promising platform for the development of transparent, durable UV-barrier coatings on polymers for use in environmentally demanding applications.