Broadband EMI Shielding Performance in Optically Transparent Flexible In<sub>2</sub>O<sub>3</sub>/Ag/In<sub>2</sub>O<sub>3</sub> Thin Film Structures.

Abstract

Transparent conductive electrodes that combine flexibility with effective electromagnetic interference (EMI) shielding are important for next-gen flexible electronics and 5G/6G communication devices. Achieving high optical transparency, low sheet resistance, and broadband shielding performance remains a sophisticated task. This work demonstrates a solution: the synthesis and comprehensive characterization of flexible In₂O₃/Ag/In₂O₃ (IAI) structures on polyethylene terephthalate substrates. The optimized structure with a 13.2 ± 1.1 nm silver interlayer achieves an incredible combination of properties: high optical transmittance (82.59% at 500 nm), low sheet resistance (6.4 ± 0.8 Ω/sq), and insignificant optical haze (1.04%). Broadband EMI shielding measurements from 10 MHz to 1 THz reveal a uniform shielding effectiveness of 25-30 dB across band from radiowave to terahertz. The IAI structures also show outstanding mechanical resilience, maintaining their electrical and shielding performance under repeated bending. This unique set of attributes positions IAI thin films as a prospective material for transparent EMI shielding in advanced telecommunications and flexible optoelectronics.